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- 2005
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Mark
Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography
- Contribution to journal › Article
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Mark
An alignment procedure for nanoimprint lithography at the sub-20 nm level
(2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2004
-
Mark
Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
- Contribution to journal › Article
-
Mark
Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
(2004) 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Nanoimprint - a tool for realizing nano-bio research
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2002
-
Mark
Nanoimprinted passive optical devices
- Contribution to journal › Article
