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- 2002
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Mark
Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
New high resolution negative resist mr-L 6000.1 XP for electron beam and nanoimprint lithography
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Nanoimprint in mr-L 6000.1 XP/PMMA resist system
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Investigation of PMMA resist residues using photoelectron microscopy
(
- Contribution to journal › Article
-
Mark
A novel device principle for nanoelectronics
2002) In Materials Science and Engineering C: Materials for Biological Applications 19(1-2). p.417-420(
- Contribution to journal › Article
- 1997
-
Mark
Fabrication of Low-Dimensional Structures in III-V Semiconductors
1997)(
- Thesis › Doctoral thesis (compilation)
- 1993
-
Mark
Reevaluation of blueshifts introduced by lateral confinement in quantum-well wire structures
(
- Contribution to journal › Article