On the Edge : In situ Kelvin probe AFM on InP nanowire arrays
(2026) In Ultramicroscopy 281.- Abstract
Surface physics play an outsized role in nanostructured electronic devices such as solar cells. Semiconductor nanowires are perfect candidates for advanced solar cells due to their outstanding light absorption properties and their flexibility in axially stacking materials of different doping and band gap. Due to nanowire geometry, however, their surfaces dominate device performance and at the same time are challenging to investigate. Kelvin probe force microscopy (KPFM), an atomic force microscopy (AFM)-based method, provides a unique structural and electrical characterization even in unconventional 3D geometries. We demonstrate a high-resolution, non-destructive AFM technique for directly measuring nanowires within an array and still... (More)
Surface physics play an outsized role in nanostructured electronic devices such as solar cells. Semiconductor nanowires are perfect candidates for advanced solar cells due to their outstanding light absorption properties and their flexibility in axially stacking materials of different doping and band gap. Due to nanowire geometry, however, their surfaces dominate device performance and at the same time are challenging to investigate. Kelvin probe force microscopy (KPFM), an atomic force microscopy (AFM)-based method, provides a unique structural and electrical characterization even in unconventional 3D geometries. We demonstrate a high-resolution, non-destructive AFM technique for directly measuring nanowires within an array and still on their growth substrate. This in situ approach ensures measurement integrity and relevance while preserving the structures for subsequent measurement and processing. When compared with electron beam-induced current, cross-sectional KPFM is both more surface sensitive and less destructive. Utilizing such a cross-sectional approach facilitates rapid and comprehensive characterization of nanoelectronic surfaces.
(Less)
- author
- Irish, Austin
LU
; Hrachowina, Lukas
LU
; Alcer, David
LU
; Borgström, Magnus
LU
and Timm, Rainer
LU
- organization
-
- Lund Laser Centre, LLC
- LTH Profile Area: Photon Science and Technology
- LU Profile Area: Light and Materials
- LTH Profile Area: Nanoscience and Semiconductor Technology
- Synchrotron Radiation Research
- NanoLund: Centre for Nanoscience
- Solid State Physics
- Lund Nano Lab
- Sentio: Integrated Sensors and Adaptive Technology for Sustainable Products and Manufacturing
- LTH Profile Area: The Energy Transition
- publishing date
- 2026-03
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Afm, Atomic force microscopy, Kelvin probe force microscopy, Kpfm, Nanowire, Photovoltaic, Surface potential
- in
- Ultramicroscopy
- volume
- 281
- article number
- 114284
- publisher
- Elsevier
- external identifiers
-
- pmid:41344225
- scopus:105023656581
- ISSN
- 0304-3991
- DOI
- 10.1016/j.ultramic.2025.114284
- language
- English
- LU publication?
- yes
- additional info
- Publisher Copyright: © 2025
- id
- 0de7a2da-d933-4f03-8f23-a3b44dbb91d1
- date added to LUP
- 2026-01-12 14:54:41
- date last changed
- 2026-01-13 14:04:03
@article{0de7a2da-d933-4f03-8f23-a3b44dbb91d1,
abstract = {{<p>Surface physics play an outsized role in nanostructured electronic devices such as solar cells. Semiconductor nanowires are perfect candidates for advanced solar cells due to their outstanding light absorption properties and their flexibility in axially stacking materials of different doping and band gap. Due to nanowire geometry, however, their surfaces dominate device performance and at the same time are challenging to investigate. Kelvin probe force microscopy (KPFM), an atomic force microscopy (AFM)-based method, provides a unique structural and electrical characterization even in unconventional 3D geometries. We demonstrate a high-resolution, non-destructive AFM technique for directly measuring nanowires within an array and still on their growth substrate. This in situ approach ensures measurement integrity and relevance while preserving the structures for subsequent measurement and processing. When compared with electron beam-induced current, cross-sectional KPFM is both more surface sensitive and less destructive. Utilizing such a cross-sectional approach facilitates rapid and comprehensive characterization of nanoelectronic surfaces.</p>}},
author = {{Irish, Austin and Hrachowina, Lukas and Alcer, David and Borgström, Magnus and Timm, Rainer}},
issn = {{0304-3991}},
keywords = {{Afm; Atomic force microscopy; Kelvin probe force microscopy; Kpfm; Nanowire; Photovoltaic; Surface potential}},
language = {{eng}},
publisher = {{Elsevier}},
series = {{Ultramicroscopy}},
title = {{On the Edge : In situ Kelvin probe AFM on InP nanowire arrays}},
url = {{http://dx.doi.org/10.1016/j.ultramic.2025.114284}},
doi = {{10.1016/j.ultramic.2025.114284}},
volume = {{281}},
year = {{2026}},
}