ACT: Advanced Chip Technology
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- 2025
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Low-frequency noise in ferroelectric III-V vertical gate-all-around FETs
2025) In IEEE Electron Device Letters(
- Contribution to journal › Article
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Interface Characterization of Plasma-Treated InAs Electrodes for Resistive Random-Access Memories Using Capacitance–Voltage Methods
2025) In Physica Status Solidi (A) Applications and Materials Science(
- Contribution to journal › Article