ACT: Advanced Chip Technology
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- 2025
-
Mark
Cryogenic ferroelectricity of HZO with an aluminum oxide interlayer
Mamidala, Karthik Ram LU
and Wernersson, Lars-Erik
LU
(2025)
In IEEE Transactions on Electron Devices
- Contribution to journal › Article
-
Mark
Low-frequency noise in ferroelectric III-V vertical gate-all-around FETs
Zhu, Zhongyunshen LU
; Mamidala, Karthik Ram
LU
; Persson, Anton E. O.
LU
and Wernersson, Lars-Erik
LU
(2025)
In IEEE Electron Device Letters
- Contribution to journal › Article
-
Mark
Interface Characterization of Plasma-Treated InAs Electrodes for Resistive Random-Access Memories Using Capacitance–Voltage Methods
Andersen, André LU ; Mamidala, Saketh Ram LU
and Wernersson, Lars Erik
LU
(2025)
In Physica Status Solidi (A) Applications and Materials Science
- Contribution to journal › Article
-
Mark
Multi-level vertical III-V nanowire gate-all-around ferroelectric FETs for in-memory computing
Mamidala, Karthik Ram LU
; Zhu, Zhongyunshen
LU
and Wernersson, Lars-Erik
LU
(2025)
- Contribution to conference › Abstract