Advanced

Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

Timm, Rainer LU ; Alexander, Fian; Hjort, Martin LU ; Thelander, Claes LU ; Lind, Erik LU ; Andersen, Jesper N LU ; Wernersson, Lars-Erik LU and Mikkelsen, Anders LU (2010) In Applied Physics Letters 97.
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Applied Physics Letters
volume
97
publisher
American Institute of Physics
external identifiers
  • wos:000282443800052
  • scopus:77957685529
ISSN
0003-6951
DOI
10.1063/1.3495776
language
English
LU publication?
yes
id
40e24a4a-c2dd-4109-aa62-836a9d4dd3c6 (old id 1712780)
date added to LUP
2010-11-04 09:59:22
date last changed
2018-06-17 03:32:53
@article{40e24a4a-c2dd-4109-aa62-836a9d4dd3c6,
  articleno    = {132904},
  author       = {Timm, Rainer and Alexander, Fian and Hjort, Martin and Thelander, Claes and Lind, Erik and Andersen, Jesper N and Wernersson, Lars-Erik and Mikkelsen, Anders},
  issn         = {0003-6951},
  language     = {eng},
  publisher    = {American Institute of Physics},
  series       = {Applied Physics Letters},
  title        = {Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2},
  url          = {http://dx.doi.org/10.1063/1.3495776},
  volume       = {97},
  year         = {2010},
}