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Concept, construction and commissioning of an alignment system for deep X-ray lithography

Wilhelmi, O; Peredkov, Serguei LU and Bogdanov, Alexei LU (2002) In Microelectronic Engineering 61-2. p.1107-1112
Abstract
An in-house-made alignment system for deep X-ray lithography is presented that features low costs, low weight and little demand in space. Synchrotron radiation illuminates alignment marks on mask and substrate. The radiation transmitted through these alignment marks is detected by X-ray-sensitive diodes. The mask is fixed to the vacuum chamber, whereas the substrate is mounted on a six-axis kinematic stage. The information about the degree of alignment is the obtained photocurrent, which reaches its maximum at the best alignment position. Variation of the photocurrent is an error signal in a feedback loop. A slit screen protects the resist in the pattern area from irradiation during the alignment procedure. The features of the alignment... (More)
An in-house-made alignment system for deep X-ray lithography is presented that features low costs, low weight and little demand in space. Synchrotron radiation illuminates alignment marks on mask and substrate. The radiation transmitted through these alignment marks is detected by X-ray-sensitive diodes. The mask is fixed to the vacuum chamber, whereas the substrate is mounted on a six-axis kinematic stage. The information about the degree of alignment is the obtained photocurrent, which reaches its maximum at the best alignment position. Variation of the photocurrent is an error signal in a feedback loop. A slit screen protects the resist in the pattern area from irradiation during the alignment procedure. The features of the alignment system offer guidelines for research groups interested in upgrading their system as well. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
LIGA, alignment, deep X-ray lithography
in
Microelectronic Engineering
volume
61-2
pages
1107 - 1112
publisher
Elsevier
external identifiers
  • wos:000176594700151
  • scopus:0036643785
ISSN
1873-5568
DOI
10.1016/S0167-9317(02)00584-1
language
English
LU publication?
yes
id
95a16cb6-d051-40c9-982f-e955038ca1bc (old id 334100)
date added to LUP
2007-11-19 12:31:57
date last changed
2017-01-01 04:30:44
@article{95a16cb6-d051-40c9-982f-e955038ca1bc,
  abstract     = {An in-house-made alignment system for deep X-ray lithography is presented that features low costs, low weight and little demand in space. Synchrotron radiation illuminates alignment marks on mask and substrate. The radiation transmitted through these alignment marks is detected by X-ray-sensitive diodes. The mask is fixed to the vacuum chamber, whereas the substrate is mounted on a six-axis kinematic stage. The information about the degree of alignment is the obtained photocurrent, which reaches its maximum at the best alignment position. Variation of the photocurrent is an error signal in a feedback loop. A slit screen protects the resist in the pattern area from irradiation during the alignment procedure. The features of the alignment system offer guidelines for research groups interested in upgrading their system as well.},
  author       = {Wilhelmi, O and Peredkov, Serguei and Bogdanov, Alexei},
  issn         = {1873-5568},
  keyword      = {LIGA,alignment,deep X-ray lithography},
  language     = {eng},
  pages        = {1107--1112},
  publisher    = {Elsevier},
  series       = {Microelectronic Engineering},
  title        = {Concept, construction and commissioning of an alignment system for deep X-ray lithography},
  url          = {http://dx.doi.org/10.1016/S0167-9317(02)00584-1},
  volume       = {61-2},
  year         = {2002},
}