Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2
Timm, Rainer LU
; Alexander, Fian
; Hjort, Martin
LU
; Thelander, Claes
LU
; Lind, Erik
LU
; Andersen, Jesper N
LU
; Wernersson, Lars-Erik
LU
and Mikkelsen, Anders
LU
(2010)
In Applied Physics Letters
97.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/1712780
- author
- Timm, Rainer
LU
; Alexander, Fian
; Hjort, Martin
LU
; Thelander, Claes
LU
; Lind, Erik
LU
; Andersen, Jesper N
LU
; Wernersson, Lars-Erik
LU
and Mikkelsen, Anders
LU
- organization
- publishing date
- 2010
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Applied Physics Letters
- volume
- 97
- article number
- 132904
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- wos:000282443800052
- scopus:77957685529
- ISSN
- 0003-6951
- DOI
- 10.1063/1.3495776
- language
- English
- LU publication?
- yes
- id
- 40e24a4a-c2dd-4109-aa62-836a9d4dd3c6 (old id 1712780)
- date added to LUP
- 2016-04-01 10:51:40
- date last changed
- 2025-10-14 09:51:33
@article{40e24a4a-c2dd-4109-aa62-836a9d4dd3c6,
author = {{Timm, Rainer and Alexander, Fian and Hjort, Martin and Thelander, Claes and Lind, Erik and Andersen, Jesper N and Wernersson, Lars-Erik and Mikkelsen, Anders}},
issn = {{0003-6951}},
language = {{eng}},
publisher = {{American Institute of Physics (AIP)}},
series = {{Applied Physics Letters}},
title = {{Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2}},
url = {{http://dx.doi.org/10.1063/1.3495776}},
doi = {{10.1063/1.3495776}},
volume = {{97}},
year = {{2010}},
}