A 4F2 Vertical Gate-all-around Nanowire Compute-in-memory Device Integrated in (1T1R) Cross-Point Arrays on Silicon
(2022) 2022 IEEE Silicon Nanoelectronics Workshop (SNW) p.1-2- Abstract
- Complete 4F2 vertical nanowire (VNW) 1T1R cells with 106 cycles switching endurance and with a demonstrated capability of performing Boolean logic are fabricated and characterized in cross-point arrays. The performance of the vertical 1T1R cell is benefited from using the same III-V/high- k interface both for the vertical GAA MOSFET selector as well as the ReRAM. In this paper, we also compare the InAs nanowire implementation to a nanowire with an InGaAs top segment to utilize the relatively larger bandgap of InGaAs to reduce sneak-path leakage currents.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/e04de5eb-cb35-4091-a48c-be228d452685
- author
- Mamidala, Saketh, Ram LU ; Persson, Karl-Magnus LU and Wernersson, Lars-Erik LU
- organization
- publishing date
- 2022-09-28
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- IEEE Silicon Nanoelectronics Workshop (SNW)
- pages
- 1 - 2
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- conference name
- 2022 IEEE Silicon Nanoelectronics Workshop (SNW)
- conference location
- Honolulu, United States
- conference dates
- 2022-06-11 - 2022-06-12
- external identifiers
-
- scopus:85141074950
- ISBN
- 978-1-6654-5979-2
- DOI
- 10.1109/SNW56633.2022.9889066
- language
- English
- LU publication?
- yes
- id
- e04de5eb-cb35-4091-a48c-be228d452685
- date added to LUP
- 2022-09-30 15:58:10
- date last changed
- 2023-11-21 05:04:09
@inproceedings{e04de5eb-cb35-4091-a48c-be228d452685, abstract = {{Complete 4F2 vertical nanowire (VNW) 1T1R cells with 10<sup>6</sup> cycles switching endurance and with a demonstrated capability of performing Boolean logic are fabricated and characterized in cross-point arrays. The performance of the vertical 1T1R cell is benefited from using the same III-V/high- k interface both for the vertical GAA MOSFET selector as well as the ReRAM. In this paper, we also compare the InAs nanowire implementation to a nanowire with an InGaAs top segment to utilize the relatively larger bandgap of InGaAs to reduce sneak-path leakage currents.}}, author = {{Mamidala, Saketh, Ram and Persson, Karl-Magnus and Wernersson, Lars-Erik}}, booktitle = {{IEEE Silicon Nanoelectronics Workshop (SNW)}}, isbn = {{978-1-6654-5979-2}}, language = {{eng}}, month = {{09}}, pages = {{1--2}}, publisher = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}}, title = {{A 4F<sup>2</sup> Vertical Gate-all-around Nanowire Compute-in-memory Device Integrated in (1T1R) Cross-Point Arrays on Silicon}}, url = {{http://dx.doi.org/10.1109/SNW56633.2022.9889066}}, doi = {{10.1109/SNW56633.2022.9889066}}, year = {{2022}}, }