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<iframe src="https://lup.lub.lu.se/search/publication?embed=1&q=author%3D%22Pfeiffer%2C+K%22+or+(documentType+any+%22bookEditor+conferenceEditor%22+and+editor%3D%22Pfeiffer%2C+K%22)&amp;hide_pagination=1&amp;hide_info=1&amp;hide_options=1"
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2020
Mark Divergent consensuses on Arctic amplification influence on midlatitude severe winter weather
Cohen, J. ; Zhang, X. ; Francis, J. ; Jung, T. ; Kwok, R. ; Overland, J. ; Ballinger, T. J. ; Bhatt, U. S. ; Chen, H. W. ^LU and Coumou, D. , et al. (2020) In Nature Climate Change 10. p.20-29
- Contribution to journal › Scientific review
2003
Mark A comparison of thermally and photochemically cross-linked polymers for nanoimprinting
Pfeiffer, K ; Reuther, F ; Fink, M ; Gruetzner, G ; Carlberg, Patrick ^LU ; Maximov, Ivan ^LU ; Montelius, Lars ^LU ; Seekamp, J ; Zankovych, S and Sotomayor-Torres, C M , et al. (2003) In Microelectronic Engineering 67-8. p.266-273
- Contribution to journal › Article
Mark Fluorescence microscopy for quality control in nanoimprint lithography
Finder, C ; Beck, Marc ^LU ; Seekamp, J ; Pfeiffer, K ; Carlberg, P ; Maximov, Ivan ^LU ; Reuther, F ; Sarwe, Eva-Lena ^LU ; Zankovich, S and Ahopelto, J , et al. (2003) 28th International Conference on Micro- and Nano-Engineering, 2002 67-8. p.623-628
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2002
Mark Nanoimprint in mr-L 6000.1 XP/PMMA resist system
Carlberg, Patrick ^LU ; Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Montelius, Lars ^LU ; Pfeiffer, K. ; Reuther, F. and Gruetzner, G. (2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark New high resolution negative resist mr-L 6000.1 XP for electron beam and nanoimprint lithography
Maximov, Ivan ^LU ; Beck, Marc ^LU ; Carlberg, Patrick ^LU ; Montelius, Lars ^LU ; Pfeiffer, K. ; Reuther, F. ; Gruetzer, G. ; Schulz, H. ; Wissen, M. and Scheer, H.-C. (2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Polymer stamps for nanoimprinting
Pfeiffer, K ; Fink, M ; Ahrens, G ; Gruetzner, G ; Reuther, F ; Seekamp, J ; Zankovych, S ; Torres, CMS ; Maximov, Ivan ^LU and Beck, Marc ^LU , et al. (2002) In Microelectronic Engineering 61-2. p.393-398
- Contribution to journal › Article

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