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- 2003
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Mark
Photoelectron escape depth in Bi2Sr2CaCu2O8+x
- Contribution to journal › Article
- 2002
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Mark
Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Scanning photoelectron microscopy study of as-grown and heat-treated chemical vapor deposition boron-doped diamond films
- Contribution to journal › Article
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Mark
Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
(2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Anisotropy of the electronic structure of low-dimensional Sr(Ca)CuO2 single crystals studied by scanning photoelectron spectromicroscopy
- Contribution to journal › Article
-
Mark
Investigation of PMMA resist residues using photoelectron microscopy
- Contribution to journal › Article
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Mark
Fusk och fysik
(2002)
- Other contribution › Miscellaneous
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Mark
Photoelectron spectromicroscopy study of Bi2Sr2CaCu2O8+x single crystal
- Contribution to journal › Article
- 2001
-
Mark
Beamline I311 at MAX-LAB : A VUV/soft X-ray undulator beamline for high resolution electron spectroscopy
(2001) In Nuclear Instruments & Methods in Physics Research. Section A: Accelerators, Spectrometers, Detectors, and Associated Equipment 467-468. p.520-524
- Contribution to journal › Article
- 1998
-
Mark
O KVV Auger emission versus resonant photoemission at the O K edge of high-Tc superconductors
- Contribution to journal › Article
