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2002
Mark Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
Maximov, Ivan ^LU ; Zakharov, AA ; Holmqvist, Tommy ^LU ; Montelius, Lars ^LU and Lindau, Ingolf ^LU (2002) 20th North American Conference on Molecular Beam Epitaxy 20(3). p.1139-1142
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
Zakharov, Alexei ^LU ; Maximov, Ivan ^LU ; Holmqvist, T. ; Montelius, Lars ^LU and Lindau, Ingolf ^LU (2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Investigation of PMMA resist residues using photoelectron microscopy
Maximov, Ivan ^LU ; Zakharov, Alexei ^LU ; Holmqvist, T. ; Montelius, Lars ^LU and Lindau, Ingolf ^LU (2002) In Journal of Vacuum Science and Technology B20(3). p.1139-1142
- Contribution to journal › Article

your query:: Remove author: Montelius, Lars (LU); Remove author: Lindau, Ingolf (LU)