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2002
Mark Concept, construction and commissioning of an alignment system for deep X-ray lithography
Wilhelmi, O ; Peredkov, Serguei ^LU and Bogdanov, Alexei ^LU (2002) In Microelectronic Engineering 61-2. p.1107-1112
- Contribution to journal › Article
Mark Polymer stamps for nanoimprinting
Pfeiffer, K ; Fink, M ; Ahrens, G ; Gruetzner, G ; Reuther, F ; Seekamp, J ; Zankovych, S ; Torres, CMS ; Maximov, Ivan ^LU and Beck, Marc ^LU , et al. (2002) In Microelectronic Engineering 61-2. p.393-398
- Contribution to journal › Article
Mark Improving stamps for 10 nm level wafer scale nanoimprint lithography
Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Ling, TGI ; Keil, M and Montelius, Lars ^LU (2002) In Microelectronic Engineering 61-2. p.441-448
- Contribution to journal › Article
1997
Mark Liquid-target laser-plasma source for X-ray lithography
Malmqvist, L ; Bogdanov, A. L ; Montelius, Lars ^LU and Hertz, H. M (1997) In Microelectronic Engineering 35(1-4). p.535-536
- Contribution to journal › Article

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