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- 2002
-
Mark
Concept, construction and commissioning of an alignment system for deep X-ray lithography
(
- Contribution to journal › Article
-
Mark
Fabrication of Si-based nanoimprint stamps with sub-20 nm features
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Improving stamps for 10 nm level wafer scale nanoimprint lithography
(
- Contribution to journal › Article
- 1997
-
Mark
Liquid-target laser-plasma source for X-ray lithography
(
- Contribution to journal › Article
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