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- 2023
-
Mark
Time evolution of surface species during the ALD of high-k oxide on InAs
(
- Contribution to journal › Article
- 2022
-
Mark
Pinhole-resistant nanocrystalline rutile TiO2 photoelectrode coatings
(
- Contribution to journal › Article
- 2020
-
Mark
Present and new frontiers in materials research by ambient pressure x-ray photoelectron spectroscopy
(
- Contribution to journal › Scientific review
-
Mark
Atomic Layer Deposition of Hafnium Oxide on InAs : Insight from Time-Resolved in Situ Studies
(
- Contribution to journal › Article
- 2019
-
Mark
Atomic Layer Deposition and Immobilised Molecular Catalysts Studied by In and Ex Situ Electron Spectroscopy
2019) 1.(
- Thesis › Doctoral thesis (compilation)
- 2018
-
Mark
Thin-Film Growth and Oxidation of Surfaces Under Relevant Pressure Conditions
(
- Chapter in Book/Report/Conference proceeding › Book chapter
- 2016
-
Mark
A versatile instrument for ambient pressure x-ray photoelectron spectroscopy : The Lund cell approach
(
- Contribution to journal › Article
- 2015
-
Mark
Low temperature deposition of silicon nitride using Si3Cl8
(
- Contribution to journal › Article
- 2014
-
Mark
Scale-up Analysis of Continuous Cross-flow Atomic Layer Deposition Reactor Designs
(
- Contribution to journal › Article
-
Mark
Dynamic parameter estimation of atomic layer deposition kinetics applied to in situ quartz crystal microbalance diagnostics
(
- Contribution to journal › Article
- 2013
-
Mark
A model-based methodology for the analysis and design of atomic layer deposition processes—Part III: Constrained multi-objective optimization
(
- Contribution to journal › Article
-
Mark
Model-based Analysis and Design of Atomic Layer Deposition Processes
2013)(
- Thesis › Doctoral thesis (compilation)
-
Mark
A model-based methodology for the analysis and design of atomic layer deposition processes-Part II: Experimental validation and mechanistic analysis
(
- Contribution to journal › Article
- 2012
-
Mark
A model-based methodology for the analysis and design of atomic layer deposition processes-Part I: Mechanistic modelling of continuous flow reactors
(
- Contribution to journal › Article
- 2011
-
Mark
Synchrotron photoemission study of (Zn,Co)O films with uniform Co distribution
2011) 10th International School and Symposium on Synchrotron Radiation in Natural Science (ISSRNS) 80(10). p.1046-1050(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding