a-plane GaN-based fully vertical FinFETs with normally-off operation
(2026) In Semiconductor Science and Technology 41(5).- Abstract
In this work, the electrical performance of fully vertical single-fin a-plane gallium nitride fin-based field-effect transistors (FinFETs) with short gate length (Lg≈ 200nm) and a drift-layer thickness of 4.3 µm is investigated. Device characteristics are evaluated over a temperature range from 25 °C to 150 °C for various fin widths. The FinFETs exhibit stable normally-off operation across the entire temperature range. For a device with a fin width of 100nm, a positive threshold voltage of 1.7 V is achieved and remains stable up to 150 °C. The same device demonstrates a specific on-resistance of 3 mΩ·cm2, a minimum subthreshold swing of 63mV dec−1, an ON/OFF current ratio of approximately 1010... (More)
In this work, the electrical performance of fully vertical single-fin a-plane gallium nitride fin-based field-effect transistors (FinFETs) with short gate length (Lg≈ 200nm) and a drift-layer thickness of 4.3 µm is investigated. Device characteristics are evaluated over a temperature range from 25 °C to 150 °C for various fin widths. The FinFETs exhibit stable normally-off operation across the entire temperature range. For a device with a fin width of 100nm, a positive threshold voltage of 1.7 V is achieved and remains stable up to 150 °C. The same device demonstrates a specific on-resistance of 3 mΩ·cm2, a minimum subthreshold swing of 63mV dec−1, an ON/OFF current ratio of approximately 1010 and a current density of 2.4kA cm−2 (133kA cm−2 when normalized to the single-fin active area, including current spreading in the drift layer). An increase in threshold voltage with temperature, particularly at 150 °C, is observed, indicating robust electrostatic control and favorable thermal stability for high-temperature power device operation.
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- author
- Garigapati, Navya Sri
LU
; So, Byeongchan
LU
; Björk, Mikael
LU
; Nawaz, Muhammad
; Darakchieva, Vanya
LU
and Lind, Erik
LU
- organization
-
- NanoLund: Centre for Nanoscience
- LTH Profile Area: AI and Digitalization
- LTH Profile Area: Nanoscience and Semiconductor Technology
- Electromagnetics and Nanoelectronics
- LU Profile Area: Light and Materials
- C3NiT: Centre for III nitride technology
- Solid State Physics
- Department of Physics
- LTH Profile Area: The Energy Transition
- publishing date
- 2026-05
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- fully vertical, gallium nitride, subthreshold swing, threshold voltage
- in
- Semiconductor Science and Technology
- volume
- 41
- issue
- 5
- publisher
- IOP Publishing
- external identifiers
-
- scopus:105037746338
- ISSN
- 0268-1242
- DOI
- 10.1088/1361-6641/ae6364
- language
- English
- LU publication?
- yes
- id
- 5c164012-72d6-4ffc-8df8-901e9979c4d5
- date added to LUP
- 2026-08-13 16:50:53
- date last changed
- 2026-08-13 16:52:05
@article{5c164012-72d6-4ffc-8df8-901e9979c4d5,
abstract = {{<p>In this work, the electrical performance of fully vertical single-fin a-plane gallium nitride fin-based field-effect transistors (FinFETs) with short gate length (L<sub>g</sub>≈ 200nm) and a drift-layer thickness of 4.3 µm is investigated. Device characteristics are evaluated over a temperature range from 25 °C to 150 °C for various fin widths. The FinFETs exhibit stable normally-off operation across the entire temperature range. For a device with a fin width of 100nm, a positive threshold voltage of 1.7 V is achieved and remains stable up to 150 °C. The same device demonstrates a specific on-resistance of 3 mΩ·cm<sup>2</sup>, a minimum subthreshold swing of 63mV dec<sup>−1</sup>, an ON/OFF current ratio of approximately 10<sup>10</sup> and a current density of 2.4kA cm<sup>−2</sup> (133kA cm<sup>−2</sup> when normalized to the single-fin active area, including current spreading in the drift layer). An increase in threshold voltage with temperature, particularly at 150 °C, is observed, indicating robust electrostatic control and favorable thermal stability for high-temperature power device operation.</p>}},
author = {{Garigapati, Navya Sri and So, Byeongchan and Björk, Mikael and Nawaz, Muhammad and Darakchieva, Vanya and Lind, Erik}},
issn = {{0268-1242}},
keywords = {{fully vertical; gallium nitride; subthreshold swing; threshold voltage}},
language = {{eng}},
number = {{5}},
publisher = {{IOP Publishing}},
series = {{Semiconductor Science and Technology}},
title = {{a-plane GaN-based fully vertical FinFETs with normally-off operation}},
url = {{http://dx.doi.org/10.1088/1361-6641/ae6364}},
doi = {{10.1088/1361-6641/ae6364}},
volume = {{41}},
year = {{2026}},
}