Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis
(2024) In ACS Omega 9(18). p.20623-20628- Abstract
Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm2 higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/626676b4-a841-434a-aa16-5eaa85015b3c
- author
- Eriksson, Axl LU ; Kawde, Anurag LU ; Hrachowina, Lukas LU ; McKibbin, Sarah R. LU ; Shi, Qi LU ; Borgström, Magnus T. LU ; Wågberg, Thomas ; Pullerits, Tönu LU and Uhlig, Jens LU
- organization
-
- LU Profile Area: Light and Materials
- LTH Profile Area: Nanoscience and Semiconductor Technology
- Chemical Physics
- NanoLund: Centre for Nanoscience
- LTH Profile Area: Photon Science and Technology
- LINXS - Institute of advanced Neutron and X-ray Science
- Solid State Physics
- eSSENCE: The e-Science Collaboration
- publishing date
- 2024
- type
- Contribution to journal
- publication status
- published
- subject
- in
- ACS Omega
- volume
- 9
- issue
- 18
- pages
- 6 pages
- publisher
- The American Chemical Society (ACS)
- external identifiers
-
- scopus:85191880373
- ISSN
- 2470-1343
- DOI
- 10.1021/acsomega.4c03039
- language
- English
- LU publication?
- yes
- additional info
- Publisher Copyright: © 2024 The Authors. Published by American Chemical Society.
- id
- 626676b4-a841-434a-aa16-5eaa85015b3c
- date added to LUP
- 2024-05-09 08:03:47
- date last changed
- 2024-05-13 11:32:15
@article{626676b4-a841-434a-aa16-5eaa85015b3c, abstract = {{<p>Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm<sup>2</sup> higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.</p>}}, author = {{Eriksson, Axl and Kawde, Anurag and Hrachowina, Lukas and McKibbin, Sarah R. and Shi, Qi and Borgström, Magnus T. and Wågberg, Thomas and Pullerits, Tönu and Uhlig, Jens}}, issn = {{2470-1343}}, language = {{eng}}, number = {{18}}, pages = {{20623--20628}}, publisher = {{The American Chemical Society (ACS)}}, series = {{ACS Omega}}, title = {{Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis}}, url = {{http://dx.doi.org/10.1021/acsomega.4c03039}}, doi = {{10.1021/acsomega.4c03039}}, volume = {{9}}, year = {{2024}}, }