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2004
Mark Nanoimprint - a tool for realizing nano-bio research
Carlberg, Patrick ^LU ; Johansson, F ; Mårtensson, Thomas ^LU ; Bunk, Richard ^LU ; Beck, Marc ^LU ; Persson, F ; Borgström, Magnus ^LU ; Nilsson, S G ; Heidari, B and Grazcyk, M , et al. (2004) 2004 4th IEEE Conference on Nanotechnology p.199-200
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Nanoimprint – a tool for realizing nano-bio research
Carlberg, Patrick ^LU ; Johansson, F ; Mårtensson, Thomas ^LU ; Beck, Marc ^LU ; Persson, F ; Nilsson, S G ; Bunk, R ; Borgström, Magnus ^LU ; Graszyk, M and Maximov, Ivan ^LU , et al. (2004) 8th International Conference on Nanometer-Scale Science and Technology, 2004
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2003
Mark Fabrication and mechanical characterization of ultrashort nanocantilevers
Ghatnekar-Nilsson, Sara ^LU ; Sarwe, Eva-Lena ^LU and Montelius, Lars ^LU (2003) In Applied Physics Letters 83(5). p.990-992
- Contribution to journal › Article
Mark Lift-off process for nanoimprint lithography
Carlberg, Patrick ^LU ; Graczyk, Mariusz ^LU ; Sarwe, Eva-Lena ^LU ; Maximov, Ivan ^LU ; Beck, Marc ^LU and Montelius, Lars ^LU (2003) 28th International Conference on Micro- and Nano-Engineering, 2002 67-8. p.203-207
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Nanoimprint technology for fabrication of three-terminal ballistic junction devices in GaInAs/InP
Maximov, Ivan ^LU ; Carlberg, Patrick ^LU ; Shorubalko, Ivan ^LU ; Wallin, Daniel ^LU ; Sarwe, Eva-Lena ^LU ; Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Seifert, Werner ^LU ; Xu, Hongqi ^LU and Montelius, Lars ^LU , et al. (2003) In Microelectronic Engineering 67-8. p.196-202
- Contribution to journal › Article
Mark Fluorescence microscopy for quality control in nanoimprint lithography
Finder, C ; Beck, Marc ^LU ; Seekamp, J ; Pfeiffer, K ; Carlberg, P ; Maximov, Ivan ^LU ; Reuther, F ; Sarwe, Eva-Lena ^LU ; Zankovich, S and Ahopelto, J , et al. (2003) 28th International Conference on Micro- and Nano-Engineering, 2002 67-8. p.623-628
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2002
Mark Improving stamps for 10 nm level wafer scale nanoimprint lithography
Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Ling, TGI ; Keil, M and Montelius, Lars ^LU (2002) In Microelectronic Engineering 61-2. p.441-448
- Contribution to journal › Article
Mark Threshold stoichiometry for beam induced nitrogen depletion of SiN
Timmers, H ; Weijers, TDM ; Elliman, RG ; Uribasterra, J ; Whitlow, Harry J ^LU and Sarwe, Eva-Lena ^LU (2002) In Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms 190. p.428-432
- Contribution to journal › Article
Mark Fabrication of Si-based nanoimprint stamps with sub-20 nm features
Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Beck, Marc ^LU ; Deppert, Knut ^LU ; Graczyk, Mariusz ^LU ; Magnusson, Martin ^LU and Montelius, Lars ^LU (2002) Micro and Nano Engineering 2001 61-2. p.449-454
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Nanoimprint in mr-L 6000.1 XP/PMMA resist system
Carlberg, Patrick ^LU ; Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Montelius, Lars ^LU ; Pfeiffer, K. ; Reuther, F. and Gruetzner, G. (2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding

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