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- 2024
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Mark
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
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- Contribution to journal › Article
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Mark
Using Iron L-Edge and Nitrogen K-Edge X-ray Absorption Spectroscopy to Improve the Understanding of the Electronic Structure of Iron Carbene Complexes
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- Contribution to journal › Article
- 2023
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Mark
Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
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- Contribution to journal › Article
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Mark
Time evolution of surface species during the ALD of high-k oxide on InAs
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- Contribution to journal › Article
- 2022
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Mark
Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research
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- Contribution to journal › Article
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Mark
Following the Kinetics of Undercover Catalysis with APXPS and the Role of Hydrogen as an Intercalation Promoter
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- Contribution to journal › Article
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Mark
Role of Temperature, Pressure, and Surface Oxygen Migration in the Initial Atomic Layer Deposition of HfO2on Anatase TiO2(101)
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- Contribution to journal › Article
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Mark
Oxygen relocation during HfO2 ALD on InAs
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- Contribution to journal › Article
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Mark
Dip-and-pull ambient pressure photoelectron spectroscopy as a spectroelectrochemistry tool for probing molecular redox processes
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- Contribution to journal › Article
- 2021
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Mark
Upgrade of the SPECIES beamline at the MAX IV Laboratory
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- Contribution to journal › Article