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- 2002
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Mark
Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Narrow UV photoemission lines from graphite
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Evaluation of the MAX wiggler
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Molecular effects in solid NaNO3 observed by x-ray absorption and resonant Auger spectroscopy
(
- Contribution to journal › Article
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Mark
MAX4, a 3 GeV light source with a flexible injector
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Narrow photoemission lines from graphite valence state
(
- Contribution to journal › Article
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Mark
Investigation of PMMA resist residues using photoelectron microscopy
(
- Contribution to journal › Article
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Mark
Status of the new injector for MAX-lab
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Photoelectron spectromicroscopy study of Bi2Sr2CaCu2O8+x single crystal
(
- Contribution to journal › Article
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Mark
Electronic and crystalline structure at the surface of epitaxial films of DyNi grown on W(110)
(
- Contribution to journal › Article