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- 2023
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Mark
New high-resolution SiO2-based positive-tone resist for electron beam lithography
2023) 49-th International Conference on Micro- and Nano-Engineering(
- Contribution to conference › Poster
- 2002
-
Mark
Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Investigation of PMMA resist residues using photoelectron microscopy
(
- Contribution to journal › Article