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Diameter reduction of nanowire tunnel heterojunctions using in situ annealing

Borg, Mattias LU orcid ; Ek, Martin LU orcid ; Dick Thelander, Kimberly LU ; Ganjipour, Bahram LU ; Dey, Anil LU ; Thelander, Claes LU and Wernersson, Lars-Erik LU (2011) In Applied Physics Letters 99.
Please use this url to cite or link to this publication:
author
; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Applied Physics Letters
volume
99
article number
203101
publisher
American Institute of Physics (AIP)
external identifiers
  • wos:000297786500050
  • scopus:81855187166
ISSN
0003-6951
DOI
10.1063/1.3662009
language
English
LU publication?
yes
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Solid State Physics (011013006), Electrical and information technology (011041010), Polymer and Materials Chemistry (LTH) (011001041)
id
e8a9e06d-b95f-4957-aecb-09d66723e229 (old id 2256522)
alternative location
http://apl.aip.org/resource/1/applab/v99/i20/p203101_s1
date added to LUP
2016-04-01 10:14:08
date last changed
2023-10-26 04:48:02
@article{e8a9e06d-b95f-4957-aecb-09d66723e229,
  author       = {{Borg, Mattias and Ek, Martin and Dick Thelander, Kimberly and Ganjipour, Bahram and Dey, Anil and Thelander, Claes and Wernersson, Lars-Erik}},
  issn         = {{0003-6951}},
  language     = {{eng}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{Applied Physics Letters}},
  title        = {{Diameter reduction of nanowire tunnel heterojunctions using in situ annealing}},
  url          = {{http://dx.doi.org/10.1063/1.3662009}},
  doi          = {{10.1063/1.3662009}},
  volume       = {{99}},
  year         = {{2011}},
}