Jiongjiong Mo (Former)
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- 2016
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Mark
Effect of Gate Voltage Stress on InGaAs MOSFET with HfO2 or Al2O3 Dielectric
- Contribution to journal › Article
- 2015
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Mark
InP Drain Engineering in Asymmetric InGaAs/InP MOSFETs
- Contribution to journal › Article
-
Mark
Defect evaluation in InGaAs field effect transistors with HfO2 or Al2O3 dielectric
- Contribution to journal › Article
- 2014
-
Mark
In GaAs MOSFETs with InP Drain
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Asymmetric InGaAs MOSFETs with InGaAs source and InP drain
(2014) 26th International Conference on Indium Phosphide and Related Materials (IPRM)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Asymmetric InGaAs/InP MOSFETs With Source/Drain Engineering
- Contribution to journal › Article
-
Mark
Reduction of off-state drain leakage in InGaAs-based metal-oxide-semiconductor field-effect transistors
- Contribution to journal › Article
- 2013
-
Mark
Characterization of Border Traps in III-V MOSFETs Using an RF Transconductance Method
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
