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Geometrical Magnetoresistance as a Tool for Carrier Mobility Extraction in InGaAs MOSFETs

Olausson, Patrik LU and Lind, Erik LU (2023) In IEEE Transactions on Electron Devices 70(11). p.5614-5618
Abstract

In this work, we for the first time show that the geometrical magnetoresistance (gMR) effect is a powerful tool for extracting the carrier mobility in diffusive InGaAs near-surface quantum well MOSFETs. The technique shows excellent agreement to Hall effect measurements, confirming its validity. In addition, the gMR approach is less time-consuming, is suitable for measurements directly on the FETs of interest, and works well even at low carrier concentrations. We investigate the temperature and gate dependence of the carrier mobility, from room temperature down to cryogenic temperatures. The peak gMR mobility for long-channel diffusive devices increases from 4700 cm2/Vs at room temperature up to 7300 cm2/Vs at 9.4 K. On the other hand,... (More)

In this work, we for the first time show that the geometrical magnetoresistance (gMR) effect is a powerful tool for extracting the carrier mobility in diffusive InGaAs near-surface quantum well MOSFETs. The technique shows excellent agreement to Hall effect measurements, confirming its validity. In addition, the gMR approach is less time-consuming, is suitable for measurements directly on the FETs of interest, and works well even at low carrier concentrations. We investigate the temperature and gate dependence of the carrier mobility, from room temperature down to cryogenic temperatures. The peak gMR mobility for long-channel diffusive devices increases from 4700 cm2/Vs at room temperature up to 7300 cm2/Vs at 9.4 K. On the other hand, short-channel quasi-ballistic devices show a low gMR mobility of 2700 and 3900 cm2/Vs at room temperature and 9.4 K, respectively. By comparing the extracted mobility from devices with different gate lengths and using quantum transport simulations, we address this drop in extracted gMR mobility to an increased degree of ballistic transport and display the limitations of the gMR method for quasi-ballistic transport.

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organization
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type
Contribution to journal
publication status
published
subject
keywords
Ballistic, carrier concentration, cryogenic, diffusive, Hall effect, InGaAs, magnetoresistance effect, mobility, MOSFET, quantum well, threshold voltage
in
IEEE Transactions on Electron Devices
volume
70
issue
11
pages
5 pages
publisher
IEEE - Institute of Electrical and Electronics Engineers Inc.
external identifiers
  • scopus:85174841131
ISSN
0018-9383
DOI
10.1109/TED.2023.3318556
project
III-V Devices for Emerging Electronic Applications
language
English
LU publication?
yes
additional info
Publisher Copyright: © 1963-2012 IEEE.
id
694bade4-fe07-42d1-8be9-7dbafae49636
date added to LUP
2023-12-13 15:06:42
date last changed
2024-02-09 10:39:50
@article{694bade4-fe07-42d1-8be9-7dbafae49636,
  abstract     = {{<p>In this work, we for the first time show that the geometrical magnetoresistance (gMR) effect is a powerful tool for extracting the carrier mobility in diffusive InGaAs near-surface quantum well MOSFETs. The technique shows excellent agreement to Hall effect measurements, confirming its validity. In addition, the gMR approach is less time-consuming, is suitable for measurements directly on the FETs of interest, and works well even at low carrier concentrations. We investigate the temperature and gate dependence of the carrier mobility, from room temperature down to cryogenic temperatures. The peak gMR mobility for long-channel diffusive devices increases from 4700 cm2/Vs at room temperature up to 7300 cm2/Vs at 9.4 K. On the other hand, short-channel quasi-ballistic devices show a low gMR mobility of 2700 and 3900 cm2/Vs at room temperature and 9.4 K, respectively. By comparing the extracted mobility from devices with different gate lengths and using quantum transport simulations, we address this drop in extracted gMR mobility to an increased degree of ballistic transport and display the limitations of the gMR method for quasi-ballistic transport.</p>}},
  author       = {{Olausson, Patrik and Lind, Erik}},
  issn         = {{0018-9383}},
  keywords     = {{Ballistic; carrier concentration; cryogenic; diffusive; Hall effect; InGaAs; magnetoresistance effect; mobility; MOSFET; quantum well; threshold voltage}},
  language     = {{eng}},
  month        = {{11}},
  number       = {{11}},
  pages        = {{5614--5618}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  series       = {{IEEE Transactions on Electron Devices}},
  title        = {{Geometrical Magnetoresistance as a Tool for Carrier Mobility Extraction in InGaAs MOSFETs}},
  url          = {{http://dx.doi.org/10.1109/TED.2023.3318556}},
  doi          = {{10.1109/TED.2023.3318556}},
  volume       = {{70}},
  year         = {{2023}},
}