Low Al-content n-type AlxGa1−xN layers with a high-electron-mobility grown by hot-wall metalorganic chemical vapor deposition
(2023) In Vacuum 217.- Abstract
In this work, we demonstrate the capability of the hot-wall metalorganic chemical vapor deposition to deliver high-quality n-AlxGa1−xN (x = 0 – 0.12, [Si] = 1×1017 cm−3) epitaxial layers on 4H-SiC(0001). All layers are crack-free, with a very small root mean square roughness (0.13 – 0.25 nm), homogeneous distribution of Al over film thickness and a very low unintentional incorporation of oxygen at the detection limit of 5×1015 cm−3 and carbon of 2×1016 cm−3. Edge type dislocations in the layers gradually increase with increasing Al content while screw dislocations only raise for x above 0.077. The room temperature electron mobility of the... (More)
In this work, we demonstrate the capability of the hot-wall metalorganic chemical vapor deposition to deliver high-quality n-AlxGa1−xN (x = 0 – 0.12, [Si] = 1×1017 cm−3) epitaxial layers on 4H-SiC(0001). All layers are crack-free, with a very small root mean square roughness (0.13 – 0.25 nm), homogeneous distribution of Al over film thickness and a very low unintentional incorporation of oxygen at the detection limit of 5×1015 cm−3 and carbon of 2×1016 cm−3. Edge type dislocations in the layers gradually increase with increasing Al content while screw dislocations only raise for x above 0.077. The room temperature electron mobility of the n-AlxGa1−xN remain in the range of 400 – 470 cm2/(V.s) for Al contents between 0.05 and 0.077 resulting in comparable or higher Baliga figure of merit with respect to GaN, and hence demonstrating their suitability for implementation as drift layers in power device applications. Further increase in Al content is found to result in significant deterioration of the electrical properties.
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- author
- Stanishev, Vallery ; Armakavicius, Nerijus ; Gogova, Daniela ; Nawaz, Muhammad ; Rorsman, Niklas ; Paskov, Plamen P. and Darakchieva, Vanya LU
- organization
- publishing date
- 2023-11
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- AlGaN, Electrical properties, GaN, MOCVD, Structural properties
- in
- Vacuum
- volume
- 217
- article number
- 112481
- publisher
- Elsevier
- external identifiers
-
- scopus:85168115015
- ISSN
- 0042-207X
- DOI
- 10.1016/j.vacuum.2023.112481
- language
- English
- LU publication?
- yes
- id
- e51deba1-e50c-45e8-866a-774e809e8620
- date added to LUP
- 2023-09-20 10:50:34
- date last changed
- 2023-11-21 22:27:15
@article{e51deba1-e50c-45e8-866a-774e809e8620, abstract = {{<p>In this work, we demonstrate the capability of the hot-wall metalorganic chemical vapor deposition to deliver high-quality n-Al<sub>x</sub>Ga<sub>1−x</sub>N (x = 0 – 0.12, [Si] = 1×10<sup>17</sup> cm<sup>−3</sup>) epitaxial layers on 4H-SiC(0001). All layers are crack-free, with a very small root mean square roughness (0.13 – 0.25 nm), homogeneous distribution of Al over film thickness and a very low unintentional incorporation of oxygen at the detection limit of 5×10<sup>15</sup> cm<sup>−3</sup> and carbon of 2×10<sup>16</sup> cm<sup>−3</sup>. Edge type dislocations in the layers gradually increase with increasing Al content while screw dislocations only raise for x above 0.077. The room temperature electron mobility of the n-Al<sub>x</sub>Ga<sub>1−x</sub>N remain in the range of 400 – 470 cm<sup>2</sup>/(V.s) for Al contents between 0.05 and 0.077 resulting in comparable or higher Baliga figure of merit with respect to GaN, and hence demonstrating their suitability for implementation as drift layers in power device applications. Further increase in Al content is found to result in significant deterioration of the electrical properties.</p>}}, author = {{Stanishev, Vallery and Armakavicius, Nerijus and Gogova, Daniela and Nawaz, Muhammad and Rorsman, Niklas and Paskov, Plamen P. and Darakchieva, Vanya}}, issn = {{0042-207X}}, keywords = {{AlGaN; Electrical properties; GaN; MOCVD; Structural properties}}, language = {{eng}}, publisher = {{Elsevier}}, series = {{Vacuum}}, title = {{Low Al-content n-type Al<sub>x</sub>Ga<sub>1−x</sub>N layers with a high-electron-mobility grown by hot-wall metalorganic chemical vapor deposition}}, url = {{http://dx.doi.org/10.1016/j.vacuum.2023.112481}}, doi = {{10.1016/j.vacuum.2023.112481}}, volume = {{217}}, year = {{2023}}, }