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- 2023
-
Mark
Time evolution of surface species during the ALD of high-k oxide on InAs
(
- Contribution to journal › Article
- 2022
-
Mark
Pinhole-resistant nanocrystalline rutile TiO2 photoelectrode coatings
(
- Contribution to journal › Article
- 2020
-
Mark
Present and new frontiers in materials research by ambient pressure x-ray photoelectron spectroscopy
(
- Contribution to journal › Scientific review
-
Mark
Atomic Layer Deposition of Hafnium Oxide on InAs : Insight from Time-Resolved in Situ Studies
(
- Contribution to journal › Article
- 2019
-
Mark
Atomic Layer Deposition and Immobilised Molecular Catalysts Studied by In and Ex Situ Electron Spectroscopy
2019) 1.(
- Thesis › Doctoral thesis (compilation)
- 2018
-
Mark
Thin-Film Growth and Oxidation of Surfaces Under Relevant Pressure Conditions
(
- Chapter in Book/Report/Conference proceeding › Book chapter
- 2016
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Mark
A versatile instrument for ambient pressure x-ray photoelectron spectroscopy : The Lund cell approach
(
- Contribution to journal › Article
- 2015
-
Mark
Low temperature deposition of silicon nitride using Si3Cl8
(
- Contribution to journal › Article
- 2014
-
Mark
Dynamic parameter estimation of atomic layer deposition kinetics applied to in situ quartz crystal microbalance diagnostics
(
- Contribution to journal › Article
-
Mark
Scale-up Analysis of Continuous Cross-flow Atomic Layer Deposition Reactor Designs
(
- Contribution to journal › Article