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- 2025
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Mark
Interface Characterization of Plasma-Treated InAs Electrodes for Resistive Random-Access Memories Using Capacitance–Voltage Methods
(2025) In Physica Status Solidi (A) Applications and Materials Science
- Contribution to journal › Article
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Mark
In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
- Contribution to journal › Article
