Joachim Schnadt
- Synchrotron Radiation Research
- Department of Physics
- NanoLund: Centre for Nanoscience
- eSSENCE: The e-Science Collaboration
- LTH Profile Area: Nanoscience and Semiconductor Technology
- LTH Profile Area: Photon Science and Technology
- LU Profile Area: Light and Materials
- MAX IV, APXPS
- MAX IV Laboratory
- MAX IV, Science division
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- 2024
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Mark
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
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- Contribution to journal › Article
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Mark
Using Iron L-Edge and Nitrogen K-Edge X-ray Absorption Spectroscopy to Improve the Understanding of the Electronic Structure of Iron Carbene Complexes
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- Contribution to journal › Article
- 2023
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Mark
Time evolution of surface species during the ALD of high-k oxide on InAs
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- Contribution to journal › Article
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Mark
Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
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- Contribution to journal › Article
- 2022
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Mark
Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research
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- Contribution to journal › Article