High-Performance InAs Nanowire MOSFETs
(2012) In IEEE Electron Device Letters 33(6). p.791-793- Abstract
- In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
    Please use this url to cite or link to this publication:
    https://lup.lub.lu.se/record/2858283
- author
- 						Dey, Anil
				LU
	; 						Thelander, Claes
				LU
	; 						Lind, Erik
				LU
				 ; 						Dick Thelander, Kimberly
				LU
	; 						Borg, Mattias
				LU ; 						Dick Thelander, Kimberly
				LU
	; 						Borg, Mattias
				LU ; 						Borgström, Magnus
				LU ; 						Borgström, Magnus
				LU ; 						Nilsson, Peter
				LU
	 and 						Wernersson, Lars-Erik
				LU ; 						Nilsson, Peter
				LU
	 and 						Wernersson, Lars-Erik
				LU
- organization
- publishing date
- 2012
- type
- Contribution to journal
- publication status
- published
- subject
- in
- IEEE Electron Device Letters
- volume
- 33
- issue
- 6
- pages
- 791 - 793
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- external identifiers
- 
                - wos:000305835000017
- scopus:84861674649
 
- ISSN
- 0741-3106
- DOI
- 10.1109/LED.2012.2190132
- language
- English
- LU publication?
- yes
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Solid State Physics (011013006), Electrical and information technology (011041010), Polymer and Materials Chemistry (LTH) (011001041)
- id
- 17de7e65-eb0c-4b2e-8669-3ec505795208 (old id 2858283)
- date added to LUP
- 2016-04-01 13:42:08
- date last changed
- 2025-10-14 09:35:49
@article{17de7e65-eb0c-4b2e-8669-3ec505795208,
  abstract     = {{In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.}},
  author       = {{Dey, Anil and Thelander, Claes and Lind, Erik and Dick Thelander, Kimberly and Borg, Mattias and Borgström, Magnus and Nilsson, Peter and Wernersson, Lars-Erik}},
  issn         = {{0741-3106}},
  language     = {{eng}},
  number       = {{6}},
  pages        = {{791--793}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  series       = {{IEEE Electron Device Letters}},
  title        = {{High-Performance InAs Nanowire MOSFETs}},
  url          = {{https://lup.lub.lu.se/search/files/3540295/3171724.pdf}},
  doi          = {{10.1109/LED.2012.2190132}},
  volume       = {{33}},
  year         = {{2012}},
}