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2006
Mark Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures
Luo, Gang ^LU ; Maximov, Ivan ^LU ; Ghatnekar-Nilsson, Sara ^LU ; Adolph, David ^LU ; Graczyk, Mariusz ^LU ; Carlberg, Patrick ^LU ; Hessman, Dan ^LU ; Zhu, T ; Liu, Z F and Xu, Hongqi ^LU , et al. (2006) 14th Intl Symp “Nanostructures: Physics and Technology”, 2006
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark An electrically tunable interdigitated cantilever array fabricated by nanoimprint lithography
Luo, Gang ^LU ; Ghatnekar-Nilsson, Sara ^LU ; Maximov, Ivan ^LU ; Graczyk, Mariusz ^LU ; Carlberg, Patrick ^LU ; Adolph, David ^LU ; Hessman, Dan ^LU ; Zhu, T ; Liu, Z F and Xu, Hongqi ^LU , et al. (2006) Intl Conf on Nanoimprint and Nanoprint Technology, 2006
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2005
Mark Nanometer-scale two-terminal semiconductor memory operating at room temperature
Song, Aimin ^LU ; Missous, M ; Omling, Pär ^LU ; Maximov, Ivan ^LU ; Seifert, Werner ^LU and Samuelson, Lars ^LU (2005) In Applied Physics Letters 86(4).
- Contribution to journal › Article
Mark Microwave detection at 110 GHz by nanowires with broken symmetry
Balocco, C ; Song, AM ; Aberg, M ; Forchel, A ; Gonzalez, T ; Mateos, J ; Maximov, Ivan ^LU ; Missous, M ; Rezazadeh, AA and Saijets, J , et al. (2005) In Nano Letters 5(7). p.1423-1427
- Contribution to journal › Article
Mark Sulfur passivation for formation of Ohmic contacts to InAs nanowire devices
Suyatin, Dmitry ^LU ; Björk, Mikael ^LU ; Thelander, Claes ^LU ; Maximov, Ivan ^LU and Samuelson, Lars ^LU (2005) 31st Intl Conf Micro- and Nano-Engineering, 2005
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Nanoimprint technology for fabrication of tunable grating structures
Luo, Gang ^LU ; Maximov, Ivan ^LU ; Graczyk, Mariusz ^LU ; Adolph, David ^LU ; Carlberg, Patrick ^LU ; Zhu, T ; Liu, Z ; Xu, Hongqi ^LU and Montelius, Lars ^LU (2005) 31st Intl Conf Micro- and Nano-Engineering, 2005
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark An alignment procedure for nanoimprint lithography at the sub-20 nm level
Adolph, David ^LU ; Bolmsjö, E ; Theander, Elke ^LU ; Saers, R ; Graczyk, Mariusz ^LU ; Hessman, Dan ^LU ; Maximov, Ivan ^LU ; Andersson-Engels, Stefan ^LU ; Persson, Anders ^LU and Wahlström, Claes-Göran ^LU , et al. (2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Electrical contacts technology for single nanowires and molecules
Suyatin, Dmitry ^LU ; Björk, Mikael ^LU ; Thelander, Claes ^LU ; Bunk, Richard ^LU ; Maximov, Ivan ^LU and Samuelson, Lars ^LU (2005)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2004
Mark Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
Whitlow, Harry J ^LU ; Ng, May Ling ^LU ; Auzelyte, Vaida ^LU ; Maximov, Ivan ^LU ; Montelius, Lars ^LU ; van Kan, JA ; Bettiol, AA and Watt, F (2004) In Nanotechnology 15(1). p.223-226
- Contribution to journal › Article
Mark Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
Beck, Marc ^LU ; Persson, F ; Carlberg, Patrick ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Ling, TGI and Montelius, Lars ^LU (2004) In Microelectronic Engineering 73-74. p.837-842
- Contribution to journal › Article

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