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- 2025
-
Mark
In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
Martin, Natalia M. LU ; Babucci, Melike ; Stolt, Lars ; Hultqvist, Adam ; Kokkonen, Esko LU
; Timm, Rainer
LU
; Schnadt, Joachim
LU
; Platzer-Björkman, Charlotte
and Törndahl, Tobias
(2025)
In ACS Applied Energy Materials
8(1).
p.461-472
- Contribution to journal › Article
-
Mark
Interface Characterization of Plasma-Treated InAs Electrodes for Resistive Random-Access Memories Using Capacitance–Voltage Methods
Andersen, André LU ; Mamidala, Saketh Ram LU
and Wernersson, Lars Erik
LU
(2025)
In Physica Status Solidi (A) Applications and Materials Science
- Contribution to journal › Article
- 2023
-
Mark
Time evolution of surface species during the ALD of high-k oxide on InAs
D'Acunto, Giulio LU ; Shayesteh, Payam LU ; Kokkonen, Esko LU
; Boix de la Cruz, Virginia
LU
; Rehman, Foqia
LU
; Mosahebfard, Zohreh
; Lind, Erik
LU
; Schnadt, Joachim
LU
and Timm, Rainer
LU
(2023)
In Surfaces and Interfaces
39(102927).
- Contribution to journal › Article
- 2020
-
Mark
Atomic Layer Deposition of Hafnium Oxide on InAs : Insight from Time-Resolved in Situ Studies
D'Acunto, Giulio LU ; Troian, Andrea LU ; Kokkonen, Esko LU
; Rehman, Foqia
LU
; Liu, Yen Po
LU
; Yngman, Sofie
LU
; Yong, Zhihua
LU
; McKibbin, Sarah R.
LU
; Gallo, Tamires
LU
and Lind, Erik
LU
, et al.
(2020)
In ACS Applied Electronic Materials
2(12).
p.3915-3922
- Contribution to journal › Article
- 2016
-
Mark
Effect of Gate Voltage Stress on InGaAs MOSFET with HfO2 or Al2O3 Dielectric
Roll, Guntrade LU ; Mo, Jiongjiong LU ; Lind, Erik LU
; Johansson, Sofia
LU
and Wernersson, Lars Erik
LU
(2016)
In IEEE Transactions on Device and Materials Reliability
16(2).
p.112-116
- Contribution to journal › Article