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- 2022
-
Mark
Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer
Löfstrand, Anette LU ; Vorobiev, Alexei ; Mumtaz, Muhammad ; Borsali, Redouane and Maximov, Ivan LU
(2022)
In Polymers
14(4).
p.1-12
- Contribution to journal › Article
- 2021
-
Mark
Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
Löfstrand, Anette LU ; Jafari Jam, Reza LU ; Mumtaz, Muhammad ; Mothander, Karolina LU ; Nylander, Tommy LU ; Vorobiev, Alexei ; Rahaman, Ahibur LU ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan LU
(2021)
Advances in Patterning Materials and Processes XXXVIII 2020
In Proceedings of SPIE - The International Society for Optical Engineering
11612.
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Block Copolymer Nanolithography for Sub-50 nm Structure Applications
(2021)
- Thesis › Doctoral thesis (compilation)
- 2018
-
Mark
Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
Graczyk, Mariusz LU ; Cattoni, Andrea ; Rösner, Benedikt ; Seniutinas, Gediminas ; Löfstrand, Anette LU ; Kvennefors, Anders LU ; Mailly, Dominique ; David, Christian and Maximov, Ivan LU
(2018)
In Microelectronic Engineering
190.
p.73-78
- Contribution to journal › Article
- 2003
-
Mark
Lift-off process for nanoimprint lithography
Carlberg, Patrick LU ; Graczyk, Mariusz LU ; Sarwe, Eva-Lena LU ; Maximov, Ivan LU
; Beck, Marc
LU
and Montelius, Lars
LU
(2003)
28th International Conference on Micro- and Nano-Engineering, 2002
67-8.
p.203-207
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding