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2025
Mark Flexible fabrication of aligned multi-nanowire circuits for on-chip prototyping
Flodgren, Vidar ^LU ; Das, Abhijit ^LU ; Sestoft, Joachim E. ^LU ; Löfström, Nathanael ; Alcer, David ^LU ; Jeddi, Hossein ^LU ; Borgström, Magnus T. ^LU ; Pettersson, Håkan ^LU ; Nygård, Jesper ^LU and Mikkelsen, Anders ^LU (2025) In Microelectronic Engineering 300.
- Contribution to journal › Article
2019
Mark Low-Frequency Noise in Nanowire and Planar III-V MOSFETs
Hellenbrand, Markus ^LU ; Kilpi, Olli-Pekka ^LU ; Svensson, Johannes ^LU ; Lind, Erik ^LU and Wernersson, Lars-Erik ^LU (2019) In Microelectronic Engineering
- Contribution to journal › Article
2018
Mark Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
Graczyk, Mariusz ^LU ; Cattoni, Andrea ; Rösner, Benedikt ; Seniutinas, Gediminas ; Löfstrand, Anette ^LU ; Kvennefors, Anders ^LU ; Mailly, Dominique ; David, Christian and Maximov, Ivan ^LU (2018) In Microelectronic Engineering 190. p.73-78
- Contribution to journal › Article
Mark Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium
Vila-Comamala, Joan ; Romano, Lucia ; Guzenko, Vitaliy ; Kagias, Matias ^LU ; Stampanoni, Marco and Jefimovs, Konstantins (2018) In Microelectronic Engineering 192. p.19-24
- Contribution to journal › Article
2017
Mark 1/f and RTS noise in InGaAs nanowire MOSFETs
Möhle, C. ; Zota, C. B. ^LU ; Hellenbrand, M. ^LU and Lind, E. ^LU (2017) Conference on Insulating Films on Semiconductors (INFOS) In Microelectronic Engineering 178. p.52-55
- Contribution to journal › Article
Mark High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
Romano, L. ; Vila-Comamala, J. ; Kagias, M. ^LU ; Vogelsang, K. ; Schift, H. ; Stampanoni, M. and Jefimovs, K. (2017) In Microelectronic Engineering 176. p.6-10
- Contribution to journal › Article
2011
Mark Temperature and annealing effects on InAs nanowire MOSFETs
Johansson, Sofia ^LU ; Gorji, Sepideh ^LU ; Borg, Mattias ^LU ; Lind, Erik ^LU and Wernersson, Lars-Erik ^LU (2011) 17th International Conference on Insultating Films on Semiconductors 88(7). p.1105-1108
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Temperature and frequency characterization of InAs nanowire and HfO2 interface using capacitance-voltage method
Astromskas, Gvidas ^LU ; Storm, Kristian ^LU ; Caroff, Philippe ^LU ; Borgström, Magnus ^LU ; Lind, Erik ^LU and Wernersson, Lars-Erik ^LU (2011) EMRS 2010 Spring Meeting on Post-Si-CMOS Electronic Devices - The Role of Ge and III-V Materials 88(4). p.444-447
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
2009
Mark Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures
Skjolding, Lars Henrik ^LU ; Turon Teixidor, Genis ^LU ; Emnéus, Jenny ^LU and Montelius, Lars ^LU (2009) 34th International Conference on Micro- and Nano-Engineering 86(4-6). p.654-656
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Deposition of HfO2 on InAs by atomic-layer deposition
Wheeler, D. ; Wernersson, Lars-Erik ^LU ; Fröberg, Linus ^LU ; Thelander, Claes ^LU ; Mikkelsen, Anders ^LU ; Weststrate, K. -J. ; Sonnet, A. ; Vogel, E. M. and Seabaugh, A. (2009) 16th Biennial Conference on Insulating Films on Semiconductors 86(7-9). p.1561-1563
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding

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