Ivan Maximov

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2021
Mark Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer : Implications for Transistor Fabrication
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Mothander, Karolina ^LU ; Nylander, Tommy ^LU ; Mumtaz, Muhammad ; Vorobiev, Alexei ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan ^LU (2021) In ACS Applied Nano Materials 4(5). p.5141-5151
- Contribution to journal › Article
2020
Mark Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
Löfstrand, Anette ^LU ; Svensson, Johannes ^LU ; Wernersson, Lars Erik ^LU and Maximov, Ivan ^LU (2020) In Nanotechnology 31(32).
- Contribution to journal › Article
Mark Wafer-scale nanofabrication of sub-100 nm arrays by deep-UV displacement Talbot lithography
Gómez, Víctor J. ^LU ; Graczyk, Mariusz ^LU ; Jam, Reza Jafari ^LU ; Lehmann, Sebastian ^LU and Maximov, Ivan ^LU (2020) In Nanotechnology 31(29).
- Contribution to journal › Article
2019
Mark Design and development of nanoimprint-enabled structures for molecular motor devices
Lindberg, Frida W. ^LU ; Korten, Till ; Löfstrand, Anette ^LU ; Rahman, Mohammad A. ; Graczyk, Mariusz ^LU ; Månsson, Alf ; Linke, Heiner ^LU and Maximov, Ivan ^LU (2019) In Materials Research Express 6(2).
- Contribution to journal › Article
Mark Displacement Talbot Lithography for Fabrication of Large Area Nanoimprint Stamps
Graczyk, Mariusz ^LU ; Asif, Muhammad ^LU and Maximov, Ivan ^LU (2019) 45-th International Conference on Micro and Nano Engineering
- Contribution to conference › Poster
Mark Novel Lift-off Process for DUV Displacement Talbot Lithography
Graczyk, Mariusz ^LU ; Gomez, Victor ^LU ; Huffman, Maria ^LU and Maximov, Ivan ^LU (2019)
- Contribution to conference › Poster
Mark Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
Löfstrand, Anette ^LU ; Suyatin, Dmitry ^LU ; Nilsson, Nicklas ; Otsuka, Issei ; Kvennefors, Anders ^LU ; Ring, Johan ; Borsali, Redouane and Maximov, Ivan ^LU (2019) 5-th DSA Symposium
- Contribution to conference › Poster
2018
Mark Block Copolymer Nanopatterning of Dielectric Mask for Selective Area InAs Vertical Nanowire Growth
Löfstrand, Anette ^LU ; Graczyk, Mariusz ^LU ; Suyatin, Dmitry ^LU ; Kvennefors, Anders ^LU ; Maximov, Ivan ^LU ; Svensson, Johannes ^LU and Wernersson, Lars-Erik ^LU (2018) 4-th International Symposium on DSA, November 11-13, 2018, Sapporo, Japan
- Contribution to conference › Abstract
Mark High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching
Khan, Sabbir Ahmed ; Suyatin, Dmitry ^LU ; Sundqvist, Jonas ^LU ; Graczyk, Mariusz ^LU ; Junige, Marcel ; Kauppinen, Christoffer ; Kvennefors, Anders ^LU ; Huffman, Maria ^LU and Maximov, Ivan ^LU (2018) In ACS Applied Nano Materials p.2476-2482
- Contribution to journal › Article
Mark Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
Graczyk, Mariusz ^LU ; Cattoni, Andrea ; Rösner, Benedikt ; Seniutinas, Gediminas ; Löfstrand, Anette ^LU ; Kvennefors, Anders ^LU ; Mailly, Dominique ; David, Christian and Maximov, Ivan ^LU (2018) In Microelectronic Engineering 190. p.73-78
- Contribution to journal › Article

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