Lars-Erik Wernersson
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- 2011
-
Mark
Self-seeded, position-controlled InAs nanowire growth on Si: A growth parameter study
- Contribution to journal › Article
-
Mark
60 GHz impulse radio measurements
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Design of RF Properties for Vertical Nanowire MOSFETs
- Contribution to journal › Article
-
Mark
RF Characterization of Vertical InAs Nanowire Wrap-Gate Transistors Integrated on Si Substrates
- Contribution to journal › Article
-
Mark
High Transconductance Self-Aligned Gate-Last Surface Channel In0.53Ga0.47As MOSFET
(2011) IEEE International Electron Devices Meeting (IEDM)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Inverter circuits based on vertical InAs nanowire MOSFETs
(2011) Swedish System-on-Chip Conference, SSoCC 2011
- Contribution to conference › Paper, not in proceeding
-
Mark
Self-aligned gate-last surface channel In0.53Ga0.47As MOSFET with selectively regrown source and drain contact layers
(2011) 69th Device Research Conference, DRC 2011
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Interface composition of atomic layer deposited HfO2 and Al2O3 thin films on InAs studied by X-ray photoemission spectroscopy
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
15 nm diameter InAs nanowire MOSFETs
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2010
-
Mark
Doping Incorporation in InAs nanowires characterized by capacitance measurements
- Contribution to journal › Article
