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- 2019
-
Mark
Low-Frequency Noise in Nanowire and Planar III-V MOSFETs
2019) In Microelectronic Engineering(
- Contribution to journal › Article
- 2018
-
Mark
Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
(
- Contribution to journal › Article
-
Mark
Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium
(
- Contribution to journal › Article
- 2017
-
Mark
1/f and RTS noise in InGaAs nanowire MOSFETs
2017) Conference on Insulating Films on Semiconductors (INFOS) In Microelectronic Engineering 178. p.52-55(
- Contribution to journal › Article
-
Mark
High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
(
- Contribution to journal › Article
- 2011
-
Mark
Temperature and annealing effects on InAs nanowire MOSFETs
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Temperature and frequency characterization of InAs nanowire and HfO2 interface using capacitance-voltage method
2011) EMRS 2010 Spring Meeting on Post-Si-CMOS Electronic Devices - The Role of Ge and III-V Materials 88(4). p.444-447(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2009
-
Mark
Deposition of HfO2 on InAs by atomic-layer deposition
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2006
-
Mark
High resolution 100kV electron beam lithography in SU-8
(
- Contribution to journal › Article
- 2003
-
Mark
Fluorescence microscopy for quality control in nanoimprint lithography
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Lift-off process for nanoimprint lithography
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Nanoimprint-induced effects on electrical and optical properties of quantum well structures
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production
(
- Contribution to journal › Article
- 2002
-
Mark
Fabrication of Si-based nanoimprint stamps with sub-20 nm features
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 1999
-
Mark
Single-electron devices via controlled assembly of designed nanoparticles
1999) Proceedings of the 1998 4th International Symposium on New Phenomena in Mesoscopic Structures (NPMS'98) In Microelectronic Engineering 47(1-4). p.179-183(
- Contribution to journal › Article