Ivan Maximov
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- 2022
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Mark
Investigating the Secondary Electron Emission of Nanomaterials Induced by a High-Resolution Proton Beam
2022) In Physica Status Solidi (B)(
- Contribution to journal › Article
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Mark
Tolerance of metal halide perovskites to mechanical treatment enables the fabrication of patterned luminescence nano- and microstructures
(
- Contribution to journal › Article
- 2021
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Mark
Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
2021) Advances in Patterning Materials and Processes XXXVIII 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11612.(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer : Implications for Transistor Fabrication
(
- Contribution to journal › Article
- 2020
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Mark
Wafer-scale nanofabrication of sub-100 nm arrays by deep-UV displacement Talbot lithography
(
- Contribution to journal › Article
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Mark
Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
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- Contribution to journal › Article
- 2019
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Mark
Design and development of nanoimprint-enabled structures for molecular motor devices
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- Contribution to journal › Article
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Mark
Displacement Talbot Lithography for Fabrication of Large Area Nanoimprint Stamps
2019) 45-th International Conference on Micro and Nano Engineering(
- Contribution to conference › Poster
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Mark
Novel Lift-off Process for DUV Displacement Talbot Lithography
2019)(
- Contribution to conference › Poster
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Mark
Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
2019) 5-th DSA Symposium(
- Contribution to conference › Poster