Mariusz Graczyk (Former)
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- 2022
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Mark
Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps
(
- Contribution to journal › Article
- 2020
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Mark
Wafer-scale nanofabrication of sub-100 nm arrays by deep-UV displacement Talbot lithography
(
- Contribution to journal › Article
- 2019
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Mark
Design and development of nanoimprint-enabled structures for molecular motor devices
(
- Contribution to journal › Article
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Mark
Displacement Talbot Lithography for Fabrication of Large Area Nanoimprint Stamps
2019) 45-th International Conference on Micro and Nano Engineering(
- Contribution to conference › Poster
-
Mark
Novel Lift-off Process for DUV Displacement Talbot Lithography
2019)(
- Contribution to conference › Poster
- 2018
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Mark
Block Copolymer Nanopatterning of Dielectric Mask for Selective Area InAs Vertical Nanowire Growth
2018) 4-th International Symposium on DSA, November 11-13, 2018, Sapporo, Japan(
- Contribution to conference › Abstract
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Mark
High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching
(
- Contribution to journal › Article
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Mark
Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
(
- Contribution to journal › Article
- 2016
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Mark
Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography
(
- Contribution to journal › Article
- 2015
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Mark
Transparent and flexible, nanostructured and mediatorless glucose/oxygen enzymatic fuel cells
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- Contribution to journal › Article
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Mark
III-V Nanowire Synthesis by Use of Electrodeposited Gold Particles.
(
- Contribution to journal › Article
- 2014
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Mark
Efficient ultra-thin transmission silicon detectors for a single-ion irradiation system at the Lund Ion Beam Analysis Facility
(
- Contribution to journal › Article
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Mark
Study of photocurrent generation in InP nanowire-based p(+)-i-n(+) photodetectors
(
- Contribution to journal › Article
- 2013
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Mark
Fabrication and Characterization of Ultra-Thin PIN Silicon Detectors for Counting the Passage of MeV Ions
(
- Contribution to journal › Article
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Mark
Enhanced Anisotropic Effective g Factors of an Al10.25Ga0.75N/GaN Heterostructure Based Quantum Point Contact
(
- Contribution to journal › Article
- 2012
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Mark
Optimization of a self-closing effect to produce nanochannels with top slits in fused silica
(
- Contribution to journal › Article
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Mark
Fabrication of bottle-shaped nanochannels in fused silica using a self-closing effect
(
- Contribution to journal › Article
- 2010
-
Mark
Electrochemical Investigation of Nickel Pattern Electrodes in H-2/H2O and CO/CO2 Atmospheres
(
- Contribution to journal › Article
-
Mark
Nonlinear electrical properties of Si three-terminal junction devices
(
- Contribution to journal › Article
- 2006
-
Mark
Nanoimprint lithography for the fabrication of interdigitated cantilever arrays
(
- Contribution to journal › Article
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Mark
An electrically tunable interdigitated cantilever array fabricated by nanoimprint lithography
2006) Intl Conf on Nanoimprint and Nanoprint Technology, 2006(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Measurements of the stopping forces for heavy ions in Ge, Ag and Au using novel 'polka-dot' detectors
2006) In Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms 251(2). p.352-360(
- Contribution to journal › Article
-
Mark
Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures
2006) 14th Intl Symp “Nanostructures: Physics and Technology”, 2006(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Nanoimprint-based fabrication and characterization of interdigitated cantilevver array
2006) International Conference on Nanoscience and Technology, 2006(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2005
-
Mark
Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography
(
- Contribution to journal › Article
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Mark
Nanoimprint technology for fabrication of tunable grating structures
2005) 31st Intl Conf Micro- and Nano-Engineering, 2005(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
An alignment procedure for nanoimprint lithography at the sub-20 nm level
2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2004
-
Mark
Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
(
- Contribution to journal › Article
-
Mark
Energy loss measurements for mass-14 ions using a patterned stopping medium on a PIN diode
2004) In Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms 219-20. p.263-267(
- Contribution to journal › Article
-
Mark
Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
2004) Micro Nano Engin, 2003(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2003
-
Mark
Lift-off process for nanoimprint lithography
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Nanoimprint technology for fabrication of three-terminal ballistic junction devices in GaInAs/InP
(
- Contribution to journal › Article
- 2002
-
Mark
Polymer stamps for nanoimprinting
(
- Contribution to journal › Article
-
Mark
Improving stamps for 10 nm level wafer scale nanoimprint lithography
(
- Contribution to journal › Article
-
Mark
Fabrication of Si-based nanoimprint stamps with sub-20 nm features
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Next generation nanotechnologies for sensor array fabrication
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Nanoimprint in mr-L 6000.1 XP/PMMA resist system
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding